SU--8膠薄膜應(yīng)力梯度測量方法研究.pdf

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3、nwidelyusedinMEMSBecauseofitsuniqueopticalproperties，mechanicalpropertiesandchemicalproperties，andbecausethephotolithographytechnologyofSU8ischeaperthanLIGA(1ithographie，galvanoformungandabformung)technologynowadaysSU8ne

4、gativephotoresisthasbeenwidelyusedinMEMS(Micro—Electro—Mechanicsystem)sensorsandactuatorsSU一8films’mechanicalpropertiesareveryimportantifexcellentMEMSdevicesarewanted，especiallywhenSU8filmisusedassmacturelayerinMEMSdevic

5、esSimilartOusualmaterialsusedinMEMSdevicessuchaspolysilicon，mechanicalpropertiesofSU一8includeYoung’smodulus，stress，stressgradient，Poisson’Sratio，etc刪spaperpresentsatabletennisracketshapedstructuretomeasureSU一8film’Sstres

6、sgradientAlargenumberofsimulatingresultsfromCoventorWareshowthattheerrorofstressgradientislessthan1％ifthemaximumdeflectionofcircularfilmislessthan杉o(jì)fthecircularfilm’SthicknessThevalidityofthetheoryhasbeenverifiedby，4Cove

7、ntorWaresoftwareASU一8MEMSstructurefabricationprocessbasedonsacrificiallayertechnologyisalsopresentedbythispaperNocrackhasbeenseenintheteststructure，andalsotheteststructuredoesn’tadheretothesubstrateStressgradientofSU8fil

8、mCanbecalculatedaftermeasuringtheradiusofcurvatureoftheteststructurebyuseofnoncontactmicroscopicinterferometrynlenoncontactmeasuringmethodwillnotaffecttheteststructureanditsuitsboththeelectricandinsulatingmaterialmeasure

9、memandwitllagoodrepetitionInthispaperwefabricatedSU8filmsofatabletennisracketshapedstructureandcantileverbeamrespectivelythanmeasuringandcalcdmingtheirstressgradienttohaveacompositionExperimentsindicatedthatthepresentedm

10、easuringmethodissimpletooperate，andhastheadvantagesofhighaccuracyandgoodrepeatabilityT11ispaperalsomeasuredtheresidualstressofSU8filmbymicrorotatingstructuresbasedonsacrificiallayertechnologyMeasuretheamountofdeflectiono